Abstract: Thermal scanning probe lithography (t-SPL), enabled by the NanoFrazor, is a direct-write nanolithography technique that employs an ultrasharp thermal tip for simultaneous patterning and inspection of nanoscale structures with high precision. Based on localized thermal decomposition of a resist material, t-SPL enables high-resolution, proximity-effect-free patterning, while integrated topography sensing provides in-situ imaging and closed-loop feedback for nanometer-scale accuracy. In this talk, I will provide an overview of how the unique capabilities of the NanoFrazor enable a range of novel applications. First, from a lithography perspective, I will present examples including nanometer-precision grayscale patterning for advanced photonic structures, and the integration of mix-and-match lithography with markerless overlay for complex low-dimensional devices. In the second part, I will highlight how t-SPL enables localized thermomechanical modification of materials, allowing deterministic tuning of structural and functional properties. Together, these capabilities establish t-SPL as a versatile platform for photonic, optoelectronic, and quantum technologies.